Electroless Plating
蒸鍍（Evaporation）是一種物理氣相沉積（PVD）技術，其原理是在高真空環境下，透過加熱（電阻或電子束）將鍍材汽化（蒸發或昇華）為原子、分子或離子，使其飛散沉積在基板表面，冷凝形成薄膜。其核心在於真空環境可減少氣體碰撞並降低材料蒸發溫度，達到清潔、致密的鍍膜效果。
*Designed and manufactured according to customer requirements (standard products)
| Model | EVT1300 | |
| Chamber | Size | Ø330x500mm |
| Material | SUS304 | |
| Window | 4” | |
| Door | Front door | |
| Evaporation source | Tungsten Boat x4 | |
| Film thickness control | Crystal oscillator type film thickness measuring instrument, optional multi-channel film thickness controller | |
| Vacuum extraction | 粗抽pump + turbo pump | |
| Vacuum degree | ≦5×10-4 Pa (3.75×10-6 torr) | |
| Vacuum gauge and display | One set of high and low vacuum gauges | |
| 控制方式 | PLC ,觸控螢幕 | |
| Power supply | AC220V,50/60Hz | |
| 總功率 | 10kW | |
| 整體尺寸 | 1000mm x 800mm x 1500mm | |
| Weight | 350kg | |
