Magnetic spray coating machine

Magnetron Sputtering is a high-efficiency physical vapor deposition (PVD) technology. The principle is to fill an argon-filled chamber with vacuum and apply a high-voltage electric field to ionize the gas into plasma. By applying a magnetic field to the surface of the target, the electron trajectory is restricted, increasing the ionization rate, allowing argon ions to rapidly bombard the target, using momentum transfer to eject the target atoms and deposit them on the substrate to form a thin film.

*Designed and manufactured according to customer requirements (standard products)